Toshiaki Makabe
Professor Emeritus, Keio University, Japan
Low-temperature plasmas in argon are widely employed for the basic research and application fields owing to the feature of the non-chemical reactivity, the atomic data accumulation, and the cost performance of the feed gas.
In the present review, we will arrange and correlate the number density between the neutral metastable and the electron in the plasma based on the accumulated experimental and modeling studies. We will also discuss the physical property and the function of the metastable in a plasma, interface, and on a material (electrode) surface in various kinds of plasma sources under non-equilibrium conditions, including our results.
The present talk will work as a bridge between past and future of the study and development of the low-temperature plasma and of the material processing.
